发明名称 Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus
摘要 A liquid supply apparatus capable of removing micro-bubbles and particles is described, including a pipe, a laser provider and at least one micro-bubble/particle outlet. The laser provider provides a laser crossing the pipe, wherein the laser is provided in a manner such that a micro-bubble/particle blocking/repelling barrier is formed crossing the pipe blocking or repelling micro-bubbles, particles or both in the liquid in the pipe. The micro-bubble/particle outlet is disposed on the pipe between the barrier and the liquid inlet of the pipe, adjacent to the barrier for discharging micro-bubbles, particles or both.
申请公布号 US8263013(B2) 申请公布日期 2012.09.11
申请号 US201113087398 申请日期 2011.04.15
申请人 YANG CHIN-SHENG;CHIEN WEN-SHENG;UNITED MICROELECTRONICS CORP. 发明人 YANG CHIN-SHENG;CHIEN WEN-SHENG
分类号 G21K5/00;C02F1/30 主分类号 G21K5/00
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