发明名称 |
Dynamic provisional decomposition of lithographic patterns having different interaction ranges |
摘要 |
A method for obtaining mask and source patterns for printing integrated circuit patterns includes providing initial representations of a plurality of mask and source patterns. The method identifies long-range and short-range factors in the representations of the plurality of mask and source patterns, and provides a plurality of clips including a specified number of mask patterns. Short-range factors having overlapping ranges for each of the clips are specified. The method includes determining an initial processing priority for the plurality of clips, and determining a patterning relationship between integrated circuit patterns and the mask and source patterns. A primary objective is determined which expresses the printability of the integrated circuit patterns in terms of the patterning relationship. The method defines and iteratively solves a master problem employing the primary objective to generate values for the long-range factors, and solves subproblems employing a second objective for generating values for the short-range factors. |
申请公布号 |
US8266554(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US201113204440 |
申请日期 |
2011.08.05 |
申请人 |
BAGHERI SAEED;BARAHONA FRANCISCO;LADANYI LASZLO;LEE JONATHAN;MELVILLE DAVID O.;ROSENBLUTH ALAN E.;SCARPAZZA DANIELE P.;SZETO-MILLSTONE MARC A.;TIAN KEHAN;WAECHTER ANDREAS;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BAGHERI SAEED;BARAHONA FRANCISCO;LADANYI LASZLO;LEE JONATHAN;MELVILLE DAVID O.;ROSENBLUTH ALAN E.;SCARPAZZA DANIELE P.;SZETO-MILLSTONE MARC A.;TIAN KEHAN;WAECHTER ANDREAS |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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地址 |
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