发明名称 Thin film transistor with a high impurity region overlapping the gate electrode
摘要 A thin film transistor includes a gate electrode and a semiconductor layer. The semiconductor layer includes a channel region, a source region, a drain region, a low-concentration impurity region provided between the channel region and the source or drain region and a high-concentration impurity region. The high-concentration impurity region overlaps with the gate electrode.
申请公布号 US8263982(B2) 申请公布日期 2012.09.11
申请号 US20090538905 申请日期 2009.08.11
申请人 KAWATA HIDENORI;SEIKO EPSON CORPORATION 发明人 KAWATA HIDENORI
分类号 H01L31/112;H01L21/00 主分类号 H01L31/112
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