| 摘要 |
A mask of Y for a first pass is a mask in which a checker pattern having a high frequency characteristic is made to be the arrangement of the print permitting pixels, and a mask of C for the first pass is a mask in which a random image having a lower frequency characteristic is made to be the arrangement of the print permitting pixels. Further, each of the masks of Y and C for a second pass has an arrangement that mutually complements the arrangement of the print permitting pixels of the mask for the first pass. By using such masks, unevenness of the permeation speed caused by beading on a printing medium can be reduced. Further, high tolerance for interference to the mask of the prior pass and for influence of external disturbances can be achieved. |
