RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMERIC COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a resist composition, a pattern forming method and a polymeric compound.

SOLUTION: The resist composition contains a base component (A) showing changes in the solubility with a developing solution by an action of an acid, and an acid generator component (B) generating an acid by exposure. The base component (A) contains a resin component (A1) which includes a (meth)acrylate unit having a cyclic saturated hydrocarbon group having a group including an OH group in a side chain and at least one kind of (meth)acrylate unit having a specified acid labile group in the side chain, in which the proportion of the structural unit (a11) with respect to the total of the whole structural units of the resin component (A1) exceeds 35 mol%.

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