发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method of the same, which can achieve heat dissipation performance, stress relaxation performance and a bond strength at the same time. <P>SOLUTION: A semiconductor device includes a support base material 11 and a semiconductor element 15 bonded with the support base material 11 by a bonding material 16. The bonding material 16 includes a porous metal material 16a contacting the support base material 11 and the semiconductor element 15, and solder filled in at least a part of voids 16b in the porous metal material 16a. In the semiconductor device and the like, excellent heat dissipation performance and stress relaxation performance can be achieved by the porous metal material 16a, an excellent bond strength can be achieved by the solder 16c. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012174927(A) 申请公布日期 2012.09.10
申请号 JP20110036273 申请日期 2011.02.22
申请人 FUJITSU LTD 发明人
分类号 H01L23/28 主分类号 H01L23/28
代理机构 代理人
主权项
地址