| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film-forming apparatus, capable of uniformizing a film thickness distribution and film quality distribution in width direction. <P>SOLUTION: The film-forming apparatus includes: a conveyer for making a processing object travel; a line-shape deposition raw material provided to face a film-forming surface of the processing object along a direction orthogonal to the traveling direction of the processing object; a plurality of electron beam devices 23 for melting the deposition raw material; and a plurality of first ion sources 31 which emit ion beams for activating deposition particles from the deposition raw material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
