| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive sputtering apparatus having excellent workability which preferably forms a thin film made of various material on the whole surface of an object to be treated having various shapes and material kinds. <P>SOLUTION: In the sputtering apparatus, a barrel 5 for storing the object 3 to be treated and a sputtering cathode 7 having a target surface are disposed in a vacuum vessel 1. The object to be treated in the barrel is rolled and mixed by applying the movement assembling rotation, forward/backward movement and rocking to the barrel, thereby film forming of a target material is performed on the total surface of the object to be treated. <P>COPYRIGHT: (C)2012,JPO&INPIT |
