HIGH-FREQUENCY POWER SUPPLY DEVICE, PLASMA PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To obtain a high-frequency power supply device and a plasma processing apparatus which are capable of improving power utilization efficiency, and to obtain a method for manufacturing a semiconductor thin film.

SOLUTION: The high-frequency power supply device for supplying high-frequency power to a fluctuating load comprises: a high-frequency power source; a circulator which is disposed between the high-frequency power source and the fluctuating load and separates reflected power received from the fluctuating load; an adjustment unit for adjusting a phase and an amplitude of the reflected power separated by the circulator; a power combining unit which combines power outputted from the high-frequency power source with the reflected power adjusted by the adjustment unit and outputs combined power to the circulator.

COPYRIGHT: (C)2012,JPO&INPIT