| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a heat treatment method and heat treatment device which can reduce sublimates generated at the time of calcination. <P>SOLUTION: A substrate W having an anti-reflection film formed on the surface thereof by rotary coating is carried to a flash bake unit FLB. Flash light is irradiated upon the surface of the substrate W held in place on the top face of a cooling plate 81 from a flash lamp FL to heat it in an instant, whereby the anti-reflection film is calcined. Flash light irradiation makes it possible to calcine the anti-reflection film in an extremely short time. Therefore, before a large amount of sublimate is generated from the anti-reflection film, a calcination process can be completed and the temperature of the anti-reflection film can be lowered below a sublimate generation temperature. As a result, sublimates generated at the time of anti-reflection film calcination can be greatly reduced. <P>COPYRIGHT: (C)2012,JPO&INPIT |
