| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method in which deterioration of the line width precision of an exposure pattern is suppressed, and to provide a manufacturing method of the device. <P>SOLUTION: The exposure device comprises an irradiation unit which irradiates a mask with pulse oscillated first illumination light having a first wavelength, and pulse oscillated second illumination light having a second wavelength different from the first wavelength. The irradiation unit has a delay setting unit which sets the irradiation timing of the first illumination light and the second illumination light so that there is a predetermined time lag between the timing at which the mask is irradiated with the first illumination light and the timing at which the mask is irradiated with the second illumination light. <P>COPYRIGHT: (C)2012,JPO&INPIT |
