| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a controller capable of reducing the difference of the energy and flux of ions between the apparatuses, and to provide a plasma processing apparatus and a control method. <P>SOLUTION: The controller of a plasma processing apparatus comprises an electrode arranged in the processing chamber and on which a processed substrate is mounted, a first power supply circuit which supplies power to the electrode, a plasma generation unit which generates plasma in a space in the processing chamber separated from the electrode, and a second power supply circuit which supplies power to the plasma generation unit. The controller of a plasma processing apparatus is further provided with a detection unit which detects the parameters output from the first power supply circuit, and a control unit which controls power supplied by the first and second power supply circuits so that the parameters detected by the detection unit match the target values. <P>COPYRIGHT: (C)2012,JPO&INPIT |
