发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can prevent a heating and pressurizing tool from being tainted and improve yield without causing occurrence of failure in a tool protection material preventing connection materials from being adhered to the heating and pressurizing tool when manufacturing the semiconductor device by connecting electronic components. <P>SOLUTION: When a semiconductor device is manufactured by heating and pressurizing a first electronic component 1 by a heating and pressurizing tool 3 with connection materials 4 sandwiched between the first electronic component 1 and a second electronic component 2 which face each other to connect the first electronic component 1 and the second electronic component 2, heating and pressurizing are performed by intervening a tool protection material 5 having a dimension equivalent to that of a heating and pressurizing surface 31 of the heating and pressurizing tool 3 and composed of any one of a metal foil, a silicon chip and a ceramic sheet, between the heating and pressurizing surface 31 of the heating and pressurizing tool 3 and a rear face 13 that is a heated and pressurized surface of the first electronic component 1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012174722(A) 申请公布日期 2012.09.10
申请号 JP20110032150 申请日期 2011.02.17
申请人 HITACHI CHEM CO LTD 发明人
分类号 H01L21/60 主分类号 H01L21/60
代理机构 代理人
主权项
地址