| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of polishing a glass substrate for an EUVL (Extreme Ultra-Violet Lithography) optical base material suppressed in occurrence of a convex defect on a film formation surface for the EUVL optical base material. <P>SOLUTION: In this method of polishing a glass substrate 22 for an EUV lithography (EUVL) optical base material, the glass substrates 22 held to carriers 20 are sandwiched between polishing surfaces of upper and lower surface plates 12, 14 of a double-side polishing device 10, and both main surfaces of the glass substrate 22 are polished by relatively moving the upper and lower surface plates 12, 14 and the glass substrates 22 held to the carriers 20 while supplying a fluid containing polishing particles from supply holes formed on the upper surface plate 12. In the method of polishing a glass substrate for an EUVL optical base material, the glass substrate 22 is sandwiched so that the film formation surface in the EUVL optical base material faces the polishing surface of the lower surface plate 14. <P>COPYRIGHT: (C)2012,JPO&INPIT |
