| 摘要 |
FIELD: instrument making. ^ SUBSTANCE: invention relates to production of semiconductor devices and may be used for washing and drying of semiconductor wafers before lithography. Proposed device comprises processing chamber with cover accommodating detergent drying agent feed nozzles, centrifuge rotor inclined to horizontal plane, rotor drive and exhaust manifold. The latter incorporates used fluid collector arranged at chamber bottom, its axis of symmetry being shifted relative to that of the chamber. Arched plate with cut bottom surface is arranged on chamber wall above said collector to form acute angle with top arched surface directed toward rotor rotational direction. Used fluid and exhaust airflow splitters are arranged at exhaust manifold outlet. Chamber cover is provided with cup-shape taper ring. ^ EFFECT: higher quality of washing and drying, faster process, higher efficiency and reliability. ^ 7 dwg |
