发明名称 SUBSTRATE WITH EMBEDDED STACKED THROUGH-SILICON VIA DIE
摘要 A substrate with an embedded stacked through-silicon via die is described. For example, an apparatus includes a first die and a second die. The second die has one or more through-silicon vias disposed therein (TSV die). The first die is electrically coupled to the TSV die through the one or more through-silicon vias. The apparatus also includes a coreless substrate. Both the first die and the TSV die are embedded in the coreless substrate.
申请公布号 WO2012087475(A3) 申请公布日期 2012.09.07
申请号 WO2011US61628 申请日期 2011.11.21
申请人 INTEL CORPORATION;GONZALEZ, JAVIER SOTO;JOMAA, HOUSSAM 发明人 GONZALEZ, JAVIER SOTO;JOMAA, HOUSSAM
分类号 H01L23/48;H01L23/12 主分类号 H01L23/48
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