MEMBRANE-FORMING COMPOSITION CONTAINING SILICON FOR MULTILAYERED RESIST PROCESS AND PATTERN FORMATION METHOD

摘要

The invention is a film-forming composition containing silicon for a multilayered resist process containing [A] a polysiloxane and [B] an electron receptor. The electron receptor [B] is preferably at least one type of compound selected from the group consisting of quinone compounds, quinodimethane compounds, dibenzofuran compounds, and compounds represented by the following formulas (1-1) and (1-2). Polysiloxane [A] is a product of the hydrolysis and condensation of a compound comprising the silane compound represented by the following formula (2).