发明名称 METHOD FOR PRODUCING A THIN-FILM SEMICONDUCTOR BODY, AND THIN-FILM SEMICONDUCTOR BODY
摘要 A method for producing a thin-film semiconductor body, comprising the following steps: providing a growth substrate (1); epitaxially growing a semiconductor layer (3) having funnel-shaped and/or inverse pyramidal depressions (4) onto the growth substrate (1); filling the depressions (4) with a semiconductor material (6) in such a way that pyramidal coupling-out structures (13) are produced; applying a semiconductor layer sequence (7) having an active layer (8), which is suitable for generating electromagnetic radiation, to the coupling-out structures (13); applying a carrier (11) to the semiconductor layer sequence (7) and detaching at least the semiconductor layer (3) having the funnel-shaped and/or inverse pyramidal depressions (4), such that the pyramidal coupling-out structures (13) are formed as projections (14) on a radiation exit surface (12) of the thin-film semiconductor body. The invention further relates to a thin-film semiconductor body.
申请公布号 WO2012116978(A1) 申请公布日期 2012.09.07
申请号 WO2012EP53348 申请日期 2012.02.28
申请人 OSRAM OPTO SEMICONDUCTORS GMBH;LEIRER, CHRISTIAN;VOGL, ANTON;BIEBERSDORF, ANDREAS;BUTENDEICH, RAINER;RUMBOLZ, CHRISTIAN 发明人 LEIRER, CHRISTIAN;VOGL, ANTON;BIEBERSDORF, ANDREAS;BUTENDEICH, RAINER;RUMBOLZ, CHRISTIAN
分类号 H01L21/02;H01L33/22 主分类号 H01L21/02
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