发明名称 |
EXPOSURE DEVICE AND MICROLENS ARRAY STRUCTURE |
摘要 |
<p>An exposure device according to the present invention transmits exposure light from a light source through a mask wherein a plurality of patterns to be exposed are provided at a given distance in a direction orthogonal to a scanning direction, and provides an upright equal-size image of the patterns on a substrate by means of a plurality of microlenses in a microlens array. The mircolens array is constituted by microlens array chips which are connected in a second direction, and openings for transmitting the exposure light are provided in a frame shaped holder for supporting the microlens array chips, such that the openings are positioned to match the positions between the microlens array chips. Hereby, it is possible to expose a substrate on which a positive resist material is formed across regions that will become a plurality of individual substrates.</p> |
申请公布号 |
WO2012117802(A1) |
申请公布日期 |
2012.09.07 |
申请号 |
WO2012JP52379 |
申请日期 |
2012.02.02 |
申请人 |
V TECHNOLOGY CO., LTD.;MIZUMURA, MICHINOBU |
发明人 |
MIZUMURA, MICHINOBU |
分类号 |
G03F7/20;G02B13/26;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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