| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent performance deterioration of optical elements arranged in a chamber. <P>SOLUTION: An extreme-ultraviolet light generating apparatus is used together with a laser apparatus, and is connected to supply extreme-ultraviolet light to an external apparatus. The extreme-ultraviolet light generating apparatus may include: a chamber having at least one incident port for allowing laser light to enter the interior; a target supply section disposed in the chamber and supplying a target material to a predetermined region in the chamber; an etching gas loading section disposed in the chamber and allowing passage of etching gas loaded for etching debris of the target material which is released when the target material is irradiated with the laser light in the chamber and is attached to the at least one optical element; an exhaust pump connected to the chamber; at least one optical element arranged in the chamber; and at least one temperature adjustment mechanism for controlling the temperature of the at least one optical element. <P>COPYRIGHT: (C)2012,JPO&INPIT |
