发明名称 METHOD AND APPARATUS FOR MANUFACTURING GALLIUM NITRIDE FREE-STANDING SUBSTRATE
摘要 It is to suppress abnormal growth of GaN crystals around edge ends of a seed substrate. ] A susceptor is provided that has a pocket section in which a seed substrate is fixed, and a sub-susceptor provided between the susceptor and the seed substrate, the sub-susceptor being not reactive with the seed substrate, with a gap provided between the seed substrate and the sub-susceptor.
申请公布号 KR20120098972(A) 申请公布日期 2012.09.06
申请号 KR20117003389 申请日期 2011.01.07
申请人 A.E.TECH CORPORATION 发明人 GOTO HIDEKI
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
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