发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is curable with a small amount of energy, even in a case where a substance attenuating or shielding irradiated light such as a colorant exists in high concentration, or film thickness is large. <P>SOLUTION: The photosensitive composition includes: (1) a radical initiator (A) or the radical initiator (A) and a base generator (C); (2) an acid generator (B); and (3) a polymerizable substance (D). In the photosensitive composition, at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (H) by irradiation with activated light ray, the active species (H) reacts with the radical initiator (A), the acid generator (B) or the base generator (C) to generate a new active species (I), and polymerization reaction of the polymerizable substance (D) by the new active species (I) is advanced. The active species (H) or (I) is an acid or base, and the polymerization reaction of the polymerizable substance (D) is advanced by an acid generated by irradiating the acid generator (B) with activated light ray in parallel to the polymerization reaction. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012167271(A) 申请公布日期 2012.09.06
申请号 JP20120014595 申请日期 2012.01.26
申请人 SANYO CHEM IND LTD 发明人 HIGUCHI SHINTARO;MOTOFUJI AZUSAHEI
分类号 C08F2/50;C07C25/02;C07C49/84;C07C69/712;C07C211/63;C07D295/10;C07D335/16;C07D453/02;C07D487/04;C07F9/53;C08F2/44;C08G59/68;C08G65/18;C09D4/00;C09D4/02;C09D7/12;C09D11/00;C09D11/322;C09D11/324;C09D11/38;C09D133/00;C09J4/00;C09J4/02;C09J11/04;C09J11/06;C09J133/00;C09K3/00;G03F7/004;G03F7/027;G03F7/029;G03F7/032 主分类号 C08F2/50
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