| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base material with an etching mask capable of high-resolution patterning, and a manufacturing method thereof. <P>SOLUTION: A photosensitive material is applied on a surface of a base material, a resist pattern is formed by exposure and development. A DLC coating film is formed on the surface of the base material and the resist pattern, the DLC coating film formed on the resist pattern is peeled off with the resist pattern, and a DLC pattern is formed on the surface of the base material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
