发明名称 |
METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM, THE TRANSPARENT CONDUCTIVE SUBSTRATE USING THE FILM, AS WELL AS DEVICE USING THE SUBSTRATE |
摘要 |
By using a coating method, which is a method of manufacturing a transparent conductive film, with low-temperature heating lower than 300° C., a transparent conductive film with excellent transparency, conductivity, film strength, and resistance stability and a method of manufacturing this film are provided. In the method of manufacturing a transparent conductive film, a heat energy ray irradiating step is a step of irradiating with the energy rays while heating under an oxygen-containing atmosphere to a heating temperature lower than 300° C. to form the inorganic film, and the plasma processing step is a step of performing the plasma processing on the inorganic film under a non-oxidizing gas atmosphere at a substrate temperature lower than 300° C. to promote mineralization or crystallization of the film, thereby forming a conductive oxide fine-particle layer densely packed with conductive oxide fine particles having a metal oxide as a main component.
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申请公布号 |
US2012223302(A1) |
申请公布日期 |
2012.09.06 |
申请号 |
US201013261283 |
申请日期 |
2010.11.05 |
申请人 |
YUKINOBU MASAYA;MURAYAMA YUKI;NAGANO TAKAHITO;OTSUKA YOSHIHIRO;SUMITOMO METAL MINING CO., LTD. |
发明人 |
YUKINOBU MASAYA;MURAYAMA YUKI;NAGANO TAKAHITO;OTSUKA YOSHIHIRO |
分类号 |
H01L29/786;B05D5/12;B32B9/00;H05H1/24 |
主分类号 |
H01L29/786 |
代理机构 |
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