发明名称 |
DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
Disclosed is a display device including: a gate electrode; a semiconductor layer formed into an island shape on an upper side of the gate electrode; a side wall oxide film formed on a lateral surface of the semiconductor layer; and a drain electrode and a source electrode formed on an upper side of the semiconductor layer extending from a lateral side of the semiconductor layer, wherein the side wall oxide film has a thickness of 2.1 nm or more. |
申请公布号 |
US2012223315(A1) |
申请公布日期 |
2012.09.06 |
申请号 |
US201213406548 |
申请日期 |
2012.02.28 |
申请人 |
UEMURA NORIHIRO;MIYAKE HIDEKAZU;SUZUMURA ISAO;KURIYAGAWA TAKESHI;HITACHI DISPLAYS, LTD. |
发明人 |
UEMURA NORIHIRO;MIYAKE HIDEKAZU;SUZUMURA ISAO;KURIYAGAWA TAKESHI |
分类号 |
H01L29/786;H01L33/08 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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