发明名称 |
GAS SUPPLYING APPARATUS, CYLINDER CABINET PROVIDED WITH THE SAME, VALVE BOX, AND SUBSTRATE PROCESS APPARATUS |
摘要 |
A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.
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申请公布号 |
US2012222751(A1) |
申请公布日期 |
2012.09.06 |
申请号 |
US201213409327 |
申请日期 |
2012.03.01 |
申请人 |
OKABE TSUNEYUKI;TOKYO ELECTRON LIMITED |
发明人 |
OKABE TSUNEYUKI |
分类号 |
F17D1/04 |
主分类号 |
F17D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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