| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt, an acid generator, and a resist composition such that a resist pattern having a superior focus margin can be obtained. <P>SOLUTION: There is provided a salt expressed by formula (I). In the formula, Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represents a fluorine atom or perfluoroalkyl group; L<SP POS="POST">1</SP>represents a divalent saturated hydrocarbon group and the methylene group constituting the saturated hydrocarbon group may be replaced with an oxygen atom or carbonyl group; (s) is an integer of 0-3; R<SP POS="POST">1</SP>represents an alkyl group when (s) is 1, or when (s) is 2 or 3, an alkyl group mutually independently or two R<SP POS="POST">1</SP>'s bonded to the same carbon element may form the carbonyl group together with the carbon atom, and the methylene group constituting the alkyl group may be replaced with an oxygen atom or carbonyl group; and Z<SP POS="POST">+</SP>represents an organic counter ion. <P>COPYRIGHT: (C)2012,JPO&INPIT |
