发明名称 FLUX, AND METHOD FOR FORMING ELECTRICAL CONNECTION STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide flux which gives little influence on organic insulating films when forming an electrical connection structure. <P>SOLUTION: The flux includes alkanolamine, aliphatic carboxylic acid, and at least one or more kinds selected from salts thereof. The total content ratio of the alkanolamine, the aliphatic carboxylic acid, and the salts is equal to or larger than 80 mass% of the total amount of the flux. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012166226(A) 申请公布日期 2012.09.06
申请号 JP20110028389 申请日期 2011.02.14
申请人 JSR CORP 发明人 TAKAMATSU NOBUHIRO;KAWAGUCHI KAZUO
分类号 B23K35/363;B23K1/00;B23K3/00;B23K101/42;H05K3/34 主分类号 B23K35/363
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