发明名称 EXPOSURE APPARATUS AND IMAGE FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that reduces variations in light quantity on an exposed surface and an image forming apparatus with the exposure apparatus to form a high-quality image. <P>SOLUTION: The exposure apparatus includes: a lens array which includes a plurality of rod lenses arranged along a first direction and having incident end faces located within a first plane, and which forms an erect equal-magnification image on an exposed surface by collecting light beams entering through the incident end faces; and a light emitting element array which consists of a plurality of light emitting elements, which are larger in number than the rod lenses, arranged in a second plane opposite to the first plane along the first direction, the light emitting elements being displaced, from a center line extending in the first direction, in a second direction intersecting the first direction so that the light quantity of the erect equal-magnification image corresponding to the light emitting elements is greater than that in the case where the plurality of light emitting elements are arranged on the center line extending in the first direction. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012166448(A) 申请公布日期 2012.09.06
申请号 JP20110028903 申请日期 2011.02.14
申请人 FUJI XEROX CO LTD 发明人 NIITSU TAKEHIRO
分类号 B41J2/44;B41J2/45;B41J2/455;G02B3/00;H04N1/036 主分类号 B41J2/44
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