发明名称 Optical component for use in e.g. illumination device for micro-lithographic extreme UV-projection exposure system, has mirror unit immersed in medium and supported in floating manner under operational conditions
摘要 <p>The component (32) has a mirror unit (34) comprising a mirror surface (36), and a bearing unit (52) provided in vacuum liquid medium (48) e.g. liquid metal such as mercury, liquid metal alloy, or galinstan(RTM: eutectic alloy). The mirror unit is partially immersed in the liquid medium and supported in a floating manner under operational conditions. An actuator (42) comprises a chamber (50) that is filled with the liquid medium and limited by a chamber housing (54). A sealing unit (60) seals the chamber in a liquid and gas tight manner, and a projection lens comprises housing.</p>
申请公布号 DE102011111362(A1) 申请公布日期 2012.09.06
申请号 DE201110111362 申请日期 2011.08.29
申请人 CARL ZEISS SMT GMBH 发明人 WOLF, ALEXANDER;SCHWAB, MARKUS;GRUNER, TORALF;HARTJES, JOACHIM
分类号 G02B7/182;G03F7/20 主分类号 G02B7/182
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