发明名称 |
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that conventional DRAMs need refreshing every tens of milliseconds for holding data, which leads to the increase in their power consumption, and the problem of the deterioration of a transistor frequently switched between ON and OFF states which comes to the fore with the increase in the memory capacity, and the progress of the microfabrication of transistors. <P>SOLUTION: The semiconductor device comprises a transistor having a trench structure involving a trench for a gate electrode and a trench for device isolation, and having an oxide semiconductor. With the semiconductor device, the development of a short channel effect can be suppressed by appropriately setting the depth of a trench for a gate electrode even when the distance between source and drain electrodes is made smaller. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012169611(A) |
申请公布日期 |
2012.09.06 |
申请号 |
JP20120013422 |
申请日期 |
2012.01.25 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;GOTO HIROMITSU |
分类号 |
H01L29/786;H01L21/28;H01L21/336;H01L21/8242;H01L21/8247;H01L27/10;H01L27/105;H01L27/108;H01L27/115;H01L29/41;H01L29/423;H01L29/49;H01L29/788;H01L29/792 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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