| 发明名称 |
METHOD AND DEVICE FOR FORMING PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method and device that can simply form a pattern by using a block copolymer. <P>SOLUTION: The pattern forming method includes: forming a film of a block copolymer, including at least two kinds of polymers, on a substrate; heating the block copolymer film; irradiating the heated block copolymer film with UV light; and supplying a developing solution to the UV light-irradiated block copolymer film. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012166302(A) |
申请公布日期 |
2012.09.06 |
| 申请号 |
JP20110029138 |
申请日期 |
2011.02.14 |
| 申请人 |
TOKYO ELECTRON LTD;TOSHIBA CORP |
发明人 |
MURAMATSU MAKOTO;KIYONO YURIKO |
| 分类号 |
B82B3/00;B82Y40/00;H01L21/027;H01L21/3065 |
主分类号 |
B82B3/00 |
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