发明名称 |
ADHESIVE SHEET FOR WAFER PROCESSING, MARKING METHOD USING THAT SHEET AND MANUFACTURING METHOD OF MARKING CHIP |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adhesive sheet for wafer processing capable of preventing degradation of marking aptitude or contamination of a semiconductor device by removing gaseous contaminants generated by thermal decomposition of a wafer or a protective film efficiently, when marking the rear surface or the protective film by pasting the rear surface of a semiconductor wafer or the protective film side of a wafer with a protective film to the adhesive sheet and then radiating laser light from the adhesive sheet side. <P>SOLUTION: The adhesive sheet for wafer processing has a through hole, and the light transmittance thereof for the wavelength of 532-1064 nm is 70% or higher. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012169441(A) |
申请公布日期 |
2012.09.06 |
申请号 |
JP20110028838 |
申请日期 |
2011.02.14 |
申请人 |
LINTEC CORP |
发明人 |
SHINODA TOMONORI;SATO YOUSUKE |
分类号 |
H01L21/301;B23K26/00;C09J7/00;H01L21/683 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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