| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which can manufacture a resist pattern with excellent focus margin (DOF). <P>SOLUTION: A resist composition contains a resin having a structural unit represented by formula (a), an acid generator represented by formula (B1), and a solvent, where R<SP POS="POST">2</SP>represents an aliphatic hydrocarbon group or the like which may have a substituent; R<SP POS="POST">3</SP>represents a sulpholane ring group represented by formula (b); R represents a hydroxy group, an alkoxy group or an aliphatic hydrocarbon group; and * represents a direct bond to R<SP POS="POST">2</SP>. <P>COPYRIGHT: (C)2012,JPO&INPIT |
