| 摘要 |
PURPOSE: A manufacturing method of nano-rods by a thin film formation using hydrothermal synthesis and atomic layer deposition, nano-rods manufactured by using the same and a device including the same are provided to grow nano-rods having reduced defect density and excellent crystallinity and uniformity. CONSTITUTION: A manufacturing method of nano-rods by a thin film formation using hydrothermal synthesis and atomic layer deposition comprises the following steps: a first step of growing first nano-rods(20) on top of a substrate(10) by using hydrothermal synthesis; a second step of forming a thin film(30) on the surface of the nano-rods by using atomic layer deposition; and a third step of growing second nano-rods(40) at the upper part of the nano-rods by using hydrothermal synthesis. The second and third steps are repeated at least 2 times. The first nano-rods are composed of one oxide selected from zinc, silicon, titanium, tin and indium. The thin film is composed of one oxide selected from zinc, silicon, titanium, tin and indium. The second nano-rods are composed of one oxide selected from zinc, silicon, titanium, tin and indium.
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