| 摘要 |
<p>PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to reduce the defects of the resist patterns. CONSTITUTION: A resist composition includes a resin with a structural unit represented by chemical formula I, a resin which is insoluble or hardly soluble with respect to an alkali aqueous solution and is capable of being dissolved in the alkali aqueous solution by the action of acid; and an acid generator represented by chemical formula II. In chemical formula I, R1 is a hydrogen atom or a methyl group; A1 is a C1-6 alkandiyl group; and R2 is a C1-10 hydrocarbon group with a fluorine atom. In chemical formula II, R3 and R4 are respectively fluorine atoms or C1-6 perfluoroalkyl groups; X1 is a divalent C1-17 saturated hydrocarbon group, and hydrogen atoms in the divalent saturated hydrocarbon group are substitutable with fluorine atoms and -CH_2- in the divalent saturated hydrocarbon group is substitutable with -O- or -CO-; R5 is a group with a cyclic ether structure; and Z^1+ is an organic cation.</p> |
