| 摘要 |
PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to reduce the defects of the resist patterns and to improve the focus margin of the resist patterns. CONSTITUTION: A resist composition includes a resist with a structural unit represented by chemical formula I, a resin with a structural unit represented by chemical formula II, and an acid generator. The resin with the structural unit represented by chemical formula II is insoluble or hardly soluble with respect to an alkali aqueous solution and is capable of being dissolved in the alkali aqueous solution by the action of acid. In chemical formula I, R1 is a hydrogen atom or a methyl group; A1 is -(CH_2)m1-, -(CH_2)m2-O-(CH_2)m3-, or -(CH_2)m4-CO-O-(CH_2)m5-, and m1 to m5 are respectively the integer of 1 to 6; and R2 is a C1-C10 hydrocarbon group with a fluorine atom. In chemical formula II, R3 is a hydrogen atom, a halogen atom, or a C1-6 alkyl group with/without a halogen atom; and X1 is a C2-36 heterocyclic group, and hydrogen atoms in the heterocyclic group is substitutable with halogen atoms, hydroxyl groups, C1-24 hydrocarbon groups, C1-12 alkoxy groups, C2-4 acyl groups, or C2-5 acyoxy groups. |
