发明名称 IZTO TRANSPARENT THIN FILM TRANSISTOR
摘要 <p>PURPOSE: An IZTO(Indium Zinc Tin Oxide) transparent thin film transistor is provided to prevent a delamination phenomenon caused by thermal expansion coefficient difference by forming a transparent conductive IZTO thin film in magnetron sputter. CONSTITUTION: A moisture transmission prevention film(110) is formed on the top of a flexible substrate(100). A source layer(121) and a drain layer(122) are formed on the top of the moisture transmission prevention film. A channel layer(130) is formed on the top of the moisture transmission prevention film into an IZTO thin film. A gate insulating layer(140) is formed surrounding the source layer, the drain layer, and the channel layer. A gate electrode layer(150) is formed on the top of the gate insulating layer.</p>
申请公布号 KR20120097580(A) 申请公布日期 2012.09.05
申请号 KR20110016866 申请日期 2011.02.25
申请人 GUMI ELECTRONICS & INFORMATION TECHNOLOGY RESEARCH INSTITUTE 发明人 LEE, DO KYEONG;SHIN, HAN JAE;HAN, DONG CHUL;CHOI, YOUNG CHUL;HWANG, DO YOUN
分类号 H01L29/786;G02F1/136 主分类号 H01L29/786
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