METHOD OF MANUFACTURING RERAM OF THREE-DIMENSIONAL STACKED MEMORY TYPE HAVING INDEPENDENT MEMORY CELL STRUCTURE AND THE THREE-DIMENSIONAL STACKED MEMORY
摘要
PURPOSE: A method of manufacturing a resistive random access memory device of a three-dimensional stacked memory type having an independent memory cell structure and the three-dimensional stacked memory are provided to control a limit to miniaturization by producing the resistive random access memory device of a three-dimensional stacked memory structure. CONSTITUTION: A silicon substrate(10) is provided. An insulating material layer(20) is deposited on the top of the substrate. A bottom electrode layer(30) is deposited on the insulating material layer. A metal oxide(40) having resistive switching characteristics is deposited on the substrate. An upper electrode(50) is formed on a top insulating material layer.
申请公布号
KR20120097594(A)
申请公布日期
2012.09.05
申请号
KR20110016889
申请日期
2011.02.25
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
发明人
KO, DAE HONG;SOHN, HYUN CHUL;CHO, MANN HO;LEE, DOO SUNG;KIM, JONG GI