| 摘要 |
PROBLEM TO BE SOLVED: To provide thermal treatment equipment which can efficiently heat a substrate to a prescribed temperature in a wide temperature range and without occurrence of a fault. SOLUTION: The thermal treatment equipment heat-treats the substrate and is provided with a substrate supporting means having a support where the substrate is placed on the surface and holes are formed on the surface and a gas supply part supplying gas jetted from the holes of the support and floating and supporting the substrate by jetting of gas from the holes, a heating object arranged facing the support in a direction opposite to the surface of the support, and a heating means arranged in the direction opposite to the surface of the support to heat the heating object. The heating means heats the heating object and the support is heated. The substrate is heated to the prescribed temperature. COPYRIGHT: (C)2009,JPO&INPIT |
