发明名称 PHOTOMASK CLEANING APPARATUS AND CLEANING METHOD OF PHOTOMASK USING THEREBY
摘要 <p>PURPOSE: An apparatus and method for cleaning a photo mask are provided to prevent damage to a photo mask by removing pellicle adhesive remnants using laser. CONSTITUTION: A photo mask(1) includes a first region(10) and a second region(20). A pattern(15) is formed on the first region. Pellicle adhesive remnants remain in the second region. A laser provider(200) removes the pellicle adhesive remnants by applying laser to the pellicle adhesive remnants.</p>
申请公布号 KR20120097893(A) 申请公布日期 2012.09.05
申请号 KR20110017430 申请日期 2011.02.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JIN HO;AHN, YO HAN;YOON, JEONG IN;KIM, JI YOUNG
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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