PHOTOMASK CLEANING APPARATUS AND CLEANING METHOD OF PHOTOMASK USING THEREBY
摘要
<p>PURPOSE: An apparatus and method for cleaning a photo mask are provided to prevent damage to a photo mask by removing pellicle adhesive remnants using laser. CONSTITUTION: A photo mask(1) includes a first region(10) and a second region(20). A pattern(15) is formed on the first region. Pellicle adhesive remnants remain in the second region. A laser provider(200) removes the pellicle adhesive remnants by applying laser to the pellicle adhesive remnants.</p>
申请公布号
KR20120097893(A)
申请公布日期
2012.09.05
申请号
KR20110017430
申请日期
2011.02.25
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, JIN HO;AHN, YO HAN;YOON, JEONG IN;KIM, JI YOUNG