PLASMA GENERATOR AND FILM FORMING METHOD EMPLOYING SAME

摘要

PROBLEM: To generate long plasma easily at low cost and to perform a plurality of film deposition methods using a single plasma generating device. MEANS FOR SOLVING THE PROBLEM A plasma generating device is provided with, in the vacuum inside thereof, a cylindrical electrode comprising an opening in a part thereof and generating plasma therein when gas is introduced thereinto and a direct-current negative voltage is applied thereto.