发明名称 Method of smoothing the outline of a useful layer of material transferred onto a support substrate
摘要 <p>The invention provides a method of smoothing the outline of a useful layer (66) of material transferred to a support substrate (7), said method comprising at least one step of molecular bonding the front face (600) of a source substrate (6) to the receiving face (700) of a support substrate (7), and a step of transferring a useful layer (66) deriving from said source substrate (6) onto said support substrate (7). This method is characterized in that prior to said bonding step, at least one of the faces selected from said front face (600) and said receiving face (700) undergoes a machining operation intended to form a shoulder (61) over at least a portion of its periphery, said shoulder (61) defining an inner projecting zone (62) the top face (620) of regular outline (C" 6 ) so that after bonding, said useful layer (66) is transferred to said support substrate (7) with a regular outline. Application to the fabrication of a composite substrate for optics, electronics or optoelectronics.</p>
申请公布号 EP2164096(B1) 申请公布日期 2012.09.05
申请号 EP20090178890 申请日期 2003.07.16
申请人 SOITEC 发明人 GHYSELEN, BRUNO
分类号 H01L21/304;H01L21/762 主分类号 H01L21/304
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