| 摘要 |
Disclosed is a quinonediazide photosensitizer solution comprising a quinonediazide photosensitizer dissolved in an organic solvent so that the precipitation of the quinonediazide photosensitizer from a positive-type resist composition can be reduced or prevented without requiring any thermal modification treatment and the dissolution of the quinonediazide photosensitizer in the positive-type resist composition can be facilitated in the preparation of the positive-type resist composition. The quinonediazide photosensitizer solution contains a thiol compound as an agent for preventing the precipitation of the quinonediazide photosensitizer. The positive-type resist composition comprises an alkali-soluble resin, a cross-linking agent, a quinonediazide photosensitizer, and a thiol compound as an agent for preventing the precipitation of the quinonediazide photosensitizer. |
