| 摘要 |
PURPOSE: A substrate coater device for minimizing a moving distance of a slit nozzle is provided to coat chemical liquid on a surface of a processed substrate by the slit nozzle and minimize a moving distance of the slit nozzle which is required for cleaning a discharging hole of the slit nozzle. CONSTITUTION: A spare discharging device has a thin plate whose length corresponds to the width of a processed substrate. The spare discharging device has a moving unit. The moving unit moves the thin plate to place the thin plate at a first location and a second location. A thin plate cleaning device(100) is fixed to a location separated from the frontal side of a substrate support stand to clean the thin plate. A nozzle cleaning machine(300) is located between the substrate support stand and the thin plate cleaning device. The nozzle cleaning machine cleans portions around a discharging hole of the slit nozzle. |
