METHOD AND DEVICE FOR DETECTING CRACKS IN SEMICONDUCTOR SUBSTRATES
摘要
<p>The invention relates to a method and an apparatus for detecting cracks in semiconductor substrates, such as silicon wafers and solar cells. The method and apparatus are based on the detection of light deflected at a crack.</p>
申请公布号
KR20120098746(A)
申请公布日期
2012.09.05
申请号
KR20127013352
申请日期
2010.08.13
申请人
SCHOTT AG
发明人
ORTNER ANDREAS;GERSTNER KLAUS;VON CAMPE HILMAR;STELZL MICHAEL
