SUBSTRATE TRAY FOR PLASMA PROCESSING WITH EXCELLENT COOLING EFFECT AND PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A substrate tray for a plasma processing device with a superior cooling effect and the plasma processing device are provided to minimize etching imbalances by forming an embossing part on the lower side of a mounting groove of a tray body. CONSTITUTION: A tray body includes a mounting groove on the upper side thereof. One or more sapphire substrates are mounted in the mounting groove. A plurality of embossing parts(152a) are formed on the lower side of the mounting groove. A tray cover(12) faces the upper side of the tray body. The lower side of the tray body is downwardly convex.