发明名称 |
System and method for characterizing process variations |
摘要 |
A system and method for characterizing process variations are provided. A circuit comprises a plurality of inverters arranged in a sequential loop, and a plurality of transmission gates, with each transmission gate coupled between a pair of serially arranged inverters. Each transmission gate comprises a first field effect transistor (FET) having a first channel, and a second FET having a second channel. The first channel and the second channel are coupled in parallel and a gate terminal of the first FET and a gate terminal of the second FET are coupled to a first control signal and a second control signal, respectively. |
申请公布号 |
US8258883(B2) |
申请公布日期 |
2012.09.04 |
申请号 |
US20090617391 |
申请日期 |
2009.11.12 |
申请人 |
CHEN YI-WEI;HU CHI-WEI;CHANGCHIEN WEI-PIN;LIU CHIN-CHOU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHEN YI-WEI;HU CHI-WEI;CHANGCHIEN WEI-PIN;LIU CHIN-CHOU |
分类号 |
H03K3/03;G01R23/175;G01R31/26 |
主分类号 |
H03K3/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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