发明名称 System and method for characterizing process variations
摘要 A system and method for characterizing process variations are provided. A circuit comprises a plurality of inverters arranged in a sequential loop, and a plurality of transmission gates, with each transmission gate coupled between a pair of serially arranged inverters. Each transmission gate comprises a first field effect transistor (FET) having a first channel, and a second FET having a second channel. The first channel and the second channel are coupled in parallel and a gate terminal of the first FET and a gate terminal of the second FET are coupled to a first control signal and a second control signal, respectively.
申请公布号 US8258883(B2) 申请公布日期 2012.09.04
申请号 US20090617391 申请日期 2009.11.12
申请人 CHEN YI-WEI;HU CHI-WEI;CHANGCHIEN WEI-PIN;LIU CHIN-CHOU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHEN YI-WEI;HU CHI-WEI;CHANGCHIEN WEI-PIN;LIU CHIN-CHOU
分类号 H03K3/03;G01R23/175;G01R31/26 主分类号 H03K3/03
代理机构 代理人
主权项
地址