ETCHING GLASS

摘要

PURPOSE: An etching glass is provided to have reduced silicon oxide (SiO2) content in the glass substrate and to have increased aluminum oxide (Al2O3) content. CONSTITUTION: An etching glass has a porous layer formed on the glass surface. The glass substrate includes 53-63 wt% of silicon oxide (SiO2) and 10-20 wt% of aluminum oxide (Al2O3), as main components. The weight ratio of silicon (Si) compare to aluminum (Al) is 0.3-0.8. The etching reaction time of the glass substrate is 10 minutes or less. The glass substrate includes at least one of the following components as supplementary ingredients: 0-6.5 wt% of magnesium oxide (MgO), 6.8-9.81wt% of calcium oxide(CaO), 13.4-18.23 wt% of sodium oxide (Na2O), 0-0.38 wt% of potassium oxide (K2O) or and 0-0.16 wt% of antimony oxide (Sb2O3).