发明名称 |
Photolithography systems and associated methods of overlay error correction |
摘要 |
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography system includes measuring a plurality of first overlay errors that individually correspond to a microelectronic substrate in a first batch of microelectronic substrates. The method also includes determining a relationship between the first overlay errors and a first sequence of the microelectronic substrates in the first batch. The method further includes correcting a second overlay error of individual microelectronic substrates in a second batch based on a second sequence of the microelectronic substrates in the second batch and the determined relationship. |
申请公布号 |
US8260449(B2) |
申请公布日期 |
2012.09.04 |
申请号 |
US20080266276 |
申请日期 |
2008.11.06 |
申请人 |
CHUNG WOONG JAE;MICRON TECHNOLOGY, INC. |
发明人 |
CHUNG WOONG JAE |
分类号 |
G06F19/00;G03B27/32 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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